Display mask writer
Display mask writer
- Productivity For high demands regarding mask writers
- Stability Exceptional MURA quality control
- Flexibility Extreme writing speed with multi beams
Description
World-leading mask writers for tomorrow’s display standards
Everywhere we look today, we find ourselves surrounded by sophisticated display technologies. From TVs and digital signage, to smartphones, IT devices and near eye displays, the Prexision Evo series of laser mask writers play a critical role in this technological revolution. All the world’s manufacturers of advanced flat panel displays use the Prexision Evo series of laser mask writers.
The Prexision Evo series is built on the new state-of-the-art control platform called Evo, designed to support growing trends within automation, connectivity, and big data in the mask manufacturing environment in order to achieve higher product yield. The Evo platform is based upon a fully modern software and electronics architecture ready to meet both current and future requirements from the industry.
Prexision Evo series
Mycronic Prexision series
Prexision 8000 Evo
Displays continue to innovate delivering splendid imaging experiences puts an ever-increasing demand for higher refresh rates with energy efficiency considered in combination with larger display size. In addition, emerging extended reality market, requiring high resolution near-eye displays push the need for higher precision due to complexity increase in pixel design to a new, previously unseen level. The Prexision 8000 Evo is the latest and most advanced mask writer to date. It introduces a series of innovation that greatly improve resolution, positioning accuracy and stability without jeopardizing productivity. The Prexision 8000 Evo will counter all challenges seen in these days and will effectively support in developing the displays of the future.
Prexision 800 Evo
There has been a fast technological development within the display industry, the pixels getting smaller and smaller and trend towards more complex display such as AMOLED. This trend requires more complicated pixel designs and more patterns inside pixel. Prexision 800 Evo is designed to support efficient production of the most advanced display such as high resolution AMOLED displays for flagship smartphones. With 25% increase in resolution Prexision 800 Evo will deliver superior benefits to mask makers since the significant improvement of CD Uniformity and better pattern fidelity can be achieved without jeopardizing productivity by setting a new resolution standard.
Prexision 80 Evo
Prexision 8 Evo and Prexision 10
Prexision 8 Entry Evo and Prexision Lite 8 Evo
Specification
Prexision 8000 Evo |
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Mode | HA | HT |
Minimum L/S resolved (pitch/2) | 500 nm | 750 nm |
CD accuracy (range of averages) | 15 nm | 20 nm |
Mask set overlay (3σ) | 65 nm | 90 nm |
Writing speed | 900 mm²/min | 1200 mm²/min |
Max. mask size | 1400 x 1620 mm |
Prexision 800 Evo |
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Mode | HA | HT |
Minimum L/S resolved (pitch/2) | 550 nm | 850 nm |
CD accuracy (range of averages) | 15 nm | 20 nm |
Mask set overlay (3σ) | 75 nm | 100 nm |
Writing speed | 900 mm²/min | 1200 mm²/min |
Max. mask size | 1400 x 1620 mm |
Prexision 80 Evo |
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Mode | HA | HT |
Minimum L/S resolved (pitch/2) | 750 nm | 1000 nm |
CD accuracy (range of averages) | 30 nm | 35 nm |
Mask set overlay (3σ) | 75 nm | 100 nm |
Writing speed | 900 mm²/min | 1200 mm²/min |
Max. mask size | 1400 x 1620 mm |
Prexision 8 Evo |
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Mode | HA | HT |
Minimum L/S resolved (pitch/2) | 750 nm | 1000 nm |
CD accuracy (range of averages) | 70 nm | 85 nm |
Mask set overlay (3σ) | 90 nm | 120 nm |
Writing speed | 900 mm²/min | 1200 mm²/min |
Max. mask size | 1400 x 1620 mm |
Prexision 10 |
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Mode | HA | HT |
Minimum L/S resolved (pitch/2) | 750 nm | 1000 nm |
CD accuracy (range of averages) | 70 nm | 85 nm |
Mask set overlay (3σ) | 90 nm | 120 nm |
Writing speed | 900 mm²/min | 1200 mm²/min |
Max. mask size | 1700 x 2000 mm |
Prexision 8 Entry Evo and Prexision Lite 8 Evo |
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System | Prexision 8 Entry Evo | Prexision Lite 8 Evo |
Minimum L/S resolved (pitch/2) | 1200 nm | 1200 nm |
CD accuracy (range of averages) | 85 nm | 85 nm |
Mask set overlay (3σ) | 120 nm | N/A |
Writing speed | 1350 mm²/min | 1350 mm²/min |
Max. mask size | 1400 x 1620 mm |